The Surface Analysis Group utilizes Photoelectron Spectroscopy (XPS), Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), and Scanning Electron Microscopy (SEM) for chemical and morphological characterization of topmost surfaces. In particular, XPS is the most widely used surface analysis technique to provide quantitative chemical state information in a non-destructive manner. Complementary ToF-SIMS in combination with sputter depth profiling achieves chemical and molecular 3D information at high spatial resolution. All spectrometers can be accessed via atmosphere contact free sample transport. Within the R&D strategy of the IAM-ESS a central activity is also to adapt and develop the combined spectroscopic methods to chemically characterize novel materials for energy storage systems.